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고분자 합성(I)

  • Apr 09(Thu), 2026, 09:00 - 12:00
  • 포스터장
  • Chair : 김재홍, 양상희
09:00 - 10:30
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[1PS-182]

우수논문발표상 응모자

Incorporation of Aliphatic/Alicyclic Moieties in Copolyimide for Low Dielectric Adhesive at Sub-THz Frequency

발표자추은애 (한국화학연구원)

연구책임자박종민 (한국화학연구원)

공동저자추은애 (한국화학연구원), 박종민 (한국화학연구원), 원종찬 (한국화학연구원), 김윤호 (한국화학연구원)

Abstract

With the advancement of 5G/6G telecommunication technologies, the information loss through the substrate material during the signal transportation has become a severe challenge in designing high-performance antenna devices. Consequently, the utilization of low-dielectric materials for Copper Clad Laminates (CCLs), a fundamental component of Printed Circuit Boards (PCBs), is essential. Specifically, developing polymer materials with low dielectric properties at sub-THz for substrate and adhesive is an important challenge. In this study, we propose a copolyimide designed by incorporating aliphatic/alicyclic functional groups into the polymer backbone. Our polyimide exhibited low dielectric properties with Dk = 2.426, Df = 0.0031 @100GHz, as well as robust interfacial adhesion strength with 3.229 N/mm at the low roughness copper surface. We will also demonstrate the composition dependence of the physical properties to determine the optimal copolyimide composition.

Poster