The Polymer Society of Korea

Abstract

Polycrystalline CVD graphene contains grain boundaries that often become defect sites for polymer residues during conventional PMMA-assisted transfer printing. Such residual polymer particles degrade graphene’s electronic properties, acting as scattering centers that lower carrier mobility and device performance. We present a transfer printing strategy that exploits controlled dewetting to minimize grain boundary contamination. Binary solvents in the PMMA solution induce targeted dewetting on the grain boundaries of graphene, thereby reducing polymer-residue formation at defect sites. The resulting transferred graphene promises improved carrier transport and highly reliable device integration.