Vapor-phase deposited sulfur-rich polymer films; a versatile tool for next-generation optics applications
발표자
임성갑 (KAIST)
연구책임자
임성갑 (KAIST)
공동저자
임성갑 (KAIST)
초록
내용
Here, we present a unique one-step vapor-phase process, termed sulfur chemical vapor deposition (sCVD), to generate highly stable, ultrahigh refractive index (n > 1.9) polymers directly from elemental sulfur. The deposition process involved vapor-phase radical polymerization between elemental sulfur and vinyl monomers to provide polymer films with controlled thickness and sulfur content, along with the refractive index as high as 1.97. Notably, the HRIP thin film showed unprecedented optical transparency throughout the visible range, attributed to the absence of long polysulfide segments within the polymer, which will serve as a key component in a wide range of optical devices. In this presentation, the application of sCVD sulfur-rich polymer films to optical device applications will be reviewed.