[3PS-239]
Micro-Patterning of Quantum Dot Films via Indirect Photolithography for Display Applications
발표자김문근 (고려대학교)
연구책임자김문근 (고려대학교), 방준하 (고려대학교)
Abstract
Precise spatial patterning of quantum dot (QD) layers at the sub-micrometer scale is essential for integrating colloidal nanomaterials into emerging microdisplay technologies. Here, we present an indirect photolithographic strategy to fabricate microstructured QD films with excellent resolution and pattern fidelity. Surface engineering of QDs with polymeric ligands enables uniform and robust emission layers while preserving nanoscale structural integrity. This lift-off-based approach yields solvent-resistant QD micropatterns with defined geometry and compatibility with advanced color conversion architectures. Our results establish a versatile and scalable pathway for integrating QDs into high-resolution AR/VR microdisplays and next-generation optoelectronic systems.