[1PS-119]
우수논문발표상 응모자Development of Materials and Processes for Fine Metal Mask-Free Patterning of Emissive Layers in Full-Color OLED microdisplays
발표자함효빈 (울산과학기술원)
연구책임자김봉수 (울산과학기술원)
Abstract
Organic light-emitting diodes (OLEDs) used in virtual and augmented reality displays require micrometer-scale red–green–blue (RGB) pixel patterns in the emissive layer (EML). Conventional patterning methods based on evaporation and shadow masks are limited to pattern sizes larger than tens of micrometers due to geometric constraints of the mask. Here, we propose an indirect photopatterning method for solution-processed OLED EMLs, which uses crosslinkable materials and enables micrometer-scale RGB pixel patterning without direct UV exposure or harsh etching processes. By repeating the indirect photopatterning process, RGB EML patterns can be formed, with a sacrificial photoresist (PR) layer protecting the underlying EMLs from solution exposure during subsequent steps. Using a conventional photolithography setup, RGB EML patterns exceeding 3,000 pixels per inch were achieved, demonstrating the method’s industrial potential.