Nanopatterning of Sub-10 nm Feature-sized Lamellar Structures in Silicone and Fluorine-containing Block Copolymer Films
발표자
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초록
내용
The lamellar-forming polydimethylsiloxane-b-poly(2,2,3,3,3-pentafluoropropyl acrylate) (PDMS-b-PPeFPA) block copolymer (BCP) with high-χ, low-N, low-Tg and similar surface energies between two blocks was designed to avoid using top-coat materials. We confirmed the orientation change of lamellar structures in BCP films from parallel to perpendicular by varying the substrates such as standard Si substrate with native oxide layer, H-passivated Si substrate, and physically adsorbed layer. With suitable analysis, we identified the physically adsorbed copolymer layers indicate the compositional randomness to direct the lamellar oriented perpendicular to the surface. Furthermore, the significant dielectric contrast between the two blocks causes unidirectional alignment of perpendicularly oriented lamellae along a lateral electric vector. In order to use with nanoimprint lithography, we also made the inorganic based (oxidized-PDMS) nano-template using O2 plasma treatment.