Hierarchical patterns of block-copolymer films formed by multiple self-assembly
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The geometrical diversity of self-assembled di-BCP (diblock copolymer) thin films has remained limited, which hinders the practical application of the di-BCP self-assembly process. To overcome this limitation, our groups have proposed innovative methods to achieve well-organized and unconventional nanopatterns. In this study, we utilized patterned silicon substrates fabricated through the LPI(Liquid phase infiltration) process and etched by a reactive ion etching (RIE) system forming SiOx dot nanotemplates. These nanotemplates were utilized to form multiple self-assembled second layer films of diblock copolymers. The geometry of the resulting self-assembled BCP patterns was influenced by the sizes of the second layer of di-block copolymers and the film thickness on each BCP-guiding nanotemplate. To investigate the formed structures, we performed morphological characterization of the film patterns using AFM and SEM.