Antireflective Surface with Nanopillar Structures Prepared by Block Copolymer Lithography
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초록
내용
Antireflection coating (ARC) is essential in various optical and electronic applications to minimize unwanted reflections and increase light transmission efficiency. Traditional antireflective coatings rely on techniques such as thin-film deposition or surface etching, which may suffer from limitations in fabrication complexity and cost. The use of block copolymers possessing distinct polymer blocks with varying chemical properties offers a versatile and scalable approach to design antireflective coatings with tailored nanostructures. In this work, nanopillars on the surface for ARC were produced by BCP lithography, which involves infiltrating anionic metal ions into self-assembled BCP films with different properties and then transferring the patterns via reactive ion etching (RIE). The morphologies of ARC structures were characterized by SEM and TEM. UV/VIS Spectrometer was used to investigate the optical properties. The performance of antireflective coating with nanopillars of different sizes was investigated in detail.