Formation of functional polysilsesquioxane coating layer with self-healing property
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Polysilsesquioxane (PSQ) has both the inorganic properties of the siloxane bond and the organic properties of the organic functional group. Therefore, it is used as hard coatings, luminescent thin films, heat-resistant materials, lubricants, and flexible substrates. For PSQ synthesis, the hydrolysis and condensation polymerization reactions in a one-pot process using an alkaline catalyst, resulting in a ladder-structured polysilsesquioxane with a more regular and ordered arrangement and excellent physical properties compared to random structure PSQ. In this study, to improve surface hydrophobicity and self-healing properties, PSQ with fluorine groups and thiol groups were synthesized and analyzed using FT-IR and NMR. Thiol-thiol photopolymerization was conducted through UV irradiation using a photoinitiator (PBG), enabling the formation of the self-healing film. The cured film was subjected to pencil hardness testing, haze measurement, transmittance measurement, and self-healing tests to evaluate its properties.