Plasma-based surface treatment of nickel oxide hole transport layers to realize high-performance p-i-n perovskite solar cells
발표자
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초록
내용
Positive-intrinsic-negative (p-i-n) perovskite solar cells (PeSCs) have received considerable attention due to their enormous potential for a variety of applications including tandem solar cells. Nickel oxide (NiOx) is the preferred hole transport layer (HTL) for the p-i-n PeSC because of its wide bandgap and proper valence band maximum. However, NiOx-based PeSCs have shown limited efficiency due to interfacial energy losses caused by defects in the NiO surface. Surface defects impede efficient charge transfer and promote perovskite degradation, leading to a decrease in power conversion efficiency (PCE) and long-term stability. To address these issues, in this study, an attempt was made to remove defects on the NiOx surface using plasma-based surface treatment. Plasma treatment effectively reduced surface defects and charged species on the NiO surface, resulting in reduced interfacial energy loss between NiOx HTL and perovskite, and improved efficiency and stability of PeSCs.