Synthesis of Novel Oxime Benzophenone-based Photoinitiator for Application in KrF Photoresist
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초록
내용
The fine patterning technology of photoresist for color filters requires a shift to KrF photoresist(248nm) to overcome the limitations of the minimum linewidth that can be achieved by I-line photoresist(365nm). therefore, new photoinitiators that can photoreact at the KrF wavelength to generate radicals are essential major constituent. In order to further expand the application of oxime ester initiator consisting of N-OR bonds, which are known to be highly efficient in generating radicals and to absorb UV light and exhibit little color, various efforts to design new materials to improve their photolysis properties are required. To meet this need, we synthesized a novel photoinitiator containing both benzophenone-based and oxime-based compounds. The chemical structures and light absorption properties were confirmed by 1H-NMR, FT-IR, and UV-Vis analysis. The new oxime benzophenone-based photoinitiator were applied to KrF photoresist and confirmed excellent patterning properties.