Effect of Polymer Structure on E-Beam Lithography: Reducing Line Edge Roughness using Bottlebrush Polymers
발표자
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초록
내용
In this study, we compared commercial linear and synthesized bottlebrush polymers to investigate the structural effect of poly methyl methacrylate resist on e-beam lithography. The entangled structure of the high molecular weight linear polymer is widely recognized as a significant factor contributing to better line edge roughness (LER) and contrast value. In contrast, the bottlebrush structure, which lacks entanglement, tends to exhibit lower LER and higher contrast value after the developing process. The dense and compact packing of the bottlebrush polymer might reduce polymer distribution inhomogeneity and minimize aggregation in the developed region. Additionally, we utilized a coarse-grained model to gain insights into the molecular behavior of both polymer types during the developing process. These findings underscore the importance of considering the molecular structure of polymers in lithographic processes for improved resolution and pattern fidelity.