Nondestructive Direct Optical Patterning of Colloidal Emissive Nanomaterials
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초록
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Direct optical lithography offers a new platform for patterning colloidal nanocrystals, providing high pattern uniformity with a simple procedure. However, a significant decrease in photoluminescence (PL) quantum yield during the patterning process has been a major challenge. To address this challenge, we have developed direct, scalable, and nondestructive methods for high-resolution patterning of colloidal emissive nanocrystals without sacrificing their luminescent properties. The photosensitive additives incorporated in the nanocrystal inks enabled photochemically activated reactions, leading to in-situ exchange or crosslinkingof long-chain organic ligands. These reactions resulted in solubility change of the UV-exposed regions and thus enabled pattern formation. We have demonstrated uniform PL and electroluminescence patterns of RGB nanocrystals with feature sizes as small as sub-1 µm, while preserving the structural, electronic, and emissive properties.