Evaluation of flexible silica thin films derived from polysilazane using photo-base generator and UV light irradiation
발표자
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초록
내용
Perhydropolysilazane (PHPS) can form a thin silica thin film through a solution process and various curing methods. With the recent development of flexible devices, a flexible cover window technology having high hardness and flexibility in a polymer film is required. Therefore, a low-temperature curing process of PHPS that can be applied to polymer films is required. Since the photo-base generator (PBG) forms an amine when irradiated with UV light, it is possible to storage stability and a fast and efficient process at low temperature after adding it to PHPS. In this study, the conversion mechanism of PHPS was reviewed according to the type of amine formed after the addition of two types of PBG and irradiation with UV light. FT-IR and XPS were used to analyze the chemical behavior and conversion rate to silica, and it was applied to a transparent polyimide film and the properties of the flexible cover window were evaluated through transmittance, pencil hardness, and bending tests.