Antireflective PDMS layer with hydrophobicity by Cu-assisted chemical etching for solar cell applications
발표자
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초록
내용
We adopted Cu MACE (metal assisted chemical etching) method to produce antireflection structure on poly dimethyl siloxane (PDMS) films. To analyze the optical properties of structured PDSM films, we measured diffuse transmittance, total transmittance, total reflectance, and haze ratio. The anti-reflection structured PDMS films exhibited optical improvements in the visible light wavelength region. The anti-reflection structured PDMS films also showed the super-hydrophobicity (θ C ≈ 155.2 °) at the optimized structures of the film. We applied the optimized film to perovskite photovoltaic solar cell devices and observed an enhanced short-circuit current density (Jsc) from approximately 21.95 to 24.06 mAcm-2 (~ 9% increase). The improvement in Jsc increased the PCE by about 1.8%. The device performance exhibited that the super-hydrophobic anti-reflection PDMS film was successfully multi-functioned in solar cell application.