Fabrication of polystyrene nanoporous thin film with chemical resistance
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초록
내용
Nanoporous materials with a pore size ranging from 1 nm to 100 nm have demonstrated applications in a number of various fields. In particular, the large internal surface area of nanoporous materials optimizes their use as a functional structure which absorbs or interacts with atoms, ions, and molecules. In this study, we first demonstrated co-continuous phase separation morphology with a nanometer scale using spinodal decomposition of polymer blend, which is homopolymer [PS/P(S-r-2VP] blend. Next, UV ozone surface treatment was introduced to achieve open surface of nanoporous thin film as well as increasing wettability. In addition, it was confirmed that UV-ozone induces cross-linking of PS and is made into a film with chemical resistance that does not dissolve in organic solvents. UVO treatmented PS films are expected to have a wider range of applications.