Synthesis and Characterization of a Photo-patternable Polyimide Containing Urethane Linkages as Gate Dielectric for Thin Film Transistor
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초록
내용
The photo-patternable polyimide (DOCDA-6FHAB-IEM) containing urethane linkages as side chains was successfully synthesized with a simple one-step methacrylate esterification of the hydroxyl group having soluble polyimide (DOCDA-6FHAB) and isocyanatoethyl methacrylate (IEM). Urethane linkages having networked polyimide (cross-linked DOCDA-6FHAB-IEM) thin film was produced by photo-cross-linking reaction of metharylate moiety with an Irgacure 184 as photo-initiator and UV-visible exposure. Since the temperature can be lowered in the process of manufacturing the device, that the polymer itself can perform photo-crosslinking has special significance. Thin film properties of a novel urethane linkages based networked polymide film were systematically characterized such as chemical structures, surface roughness, surface energy, thermal stability, and capacitance, etc. Detailed synthetic routes of photo-patternable polymer and film fabrication condition will be presented.