Anionic polymerization of hydroxy protected monomers for photoresist application
발표자
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초록
내용
The purpose of this study is to evaluate the polymerization and physical properties of three types of 4-hydroxystyrene-based protected monomers that are anionically polymerizable and can be used in photoresists. As monomers, 1-(1-ethoxyethoxy)-4-vinylbenzene, 4-tert-butoxystyrene, and 4-(2-tetrahydropyranyloxy)styrene were used. Polymerization was carried out at -40 °C for 3 days with an s-BuLi initiator, and the synthesized polymer was measured by GPC, 1H-NMR, and DSC. As a result, it was confirmed that protected polymer having a molecular weight of about 10 kg/mol and molecular weight distribution of 1.1 was synthesized. Finally, a poly(4-hydroxystyrene) was prepared through a deprotection reaction under mild conditions.