Scalable manufacturing of heat-tolerant Titanium Nitride broadband absorber in visible light to near-infrared with multiple patterning of colloidal lithography
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Broadband perfect absorbers have been intensively researched for decades because of their near-perfect absorption optical property that can be applied to diverse applications. Unfortunately, achieving large-scale and heat-tolerant absorbers has been remained challenging because of costly and time-consuming lithography methods and thermolability of materials. Here, we demonstrate a thermally robust titanium nitride broadband absorber with ＞ 95 % absorption efficiency in the visible and near-infrared region (400-900 nm). A large-scale absorber device is fabricated by using a fabrication technique of multiple-patterning colloidal lithography. The optical properties of the absorber are still maintained even after heating at the temperatures ＞ 600 °C. Such a large-scale, heat-tolerant and broadband near-perfect absorber will provide further useful applications in solar thermophotovoltaics, stealth and absorption controlling in high-temperature conditions.