Molecular materials Containing a Large amount of Iodine as a Sensitizer to Improve the Performance of Extreme UV Resist
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초록
내용
Extreme ultraviolet light at 13.5 nm can implement finer circuit patterns than ArF (193 nm) light sources, but the number of photons absorbed per unit area is only 1/14, which deteriorates the characteristics of the resist. We synthesized a molecular material having a cyclic acetal structure using three benzaldehyde derivatives based on the vascular contrast agent molecule for computed tomography (CT) containing a lot of iodine with high absorbance. The synthesized material has excellent solubility in a resist coating solvent and is changed to a water-soluble structure through an acid-catalyzed decomposition reaction. the synthesized molecular iodide material is mixed with a resist polymer and Photoacid generator (PAG) and formed into a thin film. under extreme ultraviolet patterning conditions, The Line-edge roughness (LER) and sensitivity have obtained the patterning of improved result than the comparison group that does not contain this.