Generation of Complex Nanopatterns with High-aspect ratio and High-resolution, and Their Applications in Directed Self-assembling Template
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The development of large-area, high-resolution nano-patterning with high-aspect-ratios is a challenging problem that must be solved for potential applications in high performance nanoscale devices. To date, soft-, e-beam and soft-building block-lithography have been primarily used in such applications. Here, we describe two new patterning techniques that enables fabrication of ultra high-resolution and high-aspect-ratio patterns of various shapes. First, we introduce an advanced ultrahigh-resolution (~10nm) patterning technique that enables the fabrication of various high aspect ratio of nanostructures. This method provides many strategies to fabricate complex continuous patterns and multi-component patterns with 10 nm-scale. We also introduce a new bottom-down lithography, named dendrimer lithography, where significant progress has been made to generate single domain of supramolecular columnar structure with smaller diameters (~＜ 5nm), higher area densities in the template.