Fabricating transparent electrode based on grid-patterned silver nanowires
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Abstract: Recently, transparent conducting electrode (TCE) formed with silver nanowires (AgNWs) have been attracted attention as substitute of Indium tin oxide (ITO). However, the randomly deposited AgNW film has a poor performance in the transmittance and the sheet resistance to replace ITO. To improve the performance of AgNW film, we fabricated grid patterned AgNW by modifying the surface energy of substrate. The hydrophobized surface was selectively etched by UV light through quartz chrome mask and then the solution which was made of isopropyl alcohol (IPA) and ethylene glycol (EG), and the AgNWs was coated on the substrate by using meniscus dragging deposition (MDD) process. The grid structured AgNW films were estimated to have better property as a TCE than the randomly deposited AgNW films by measuring the transmittance and the sheet resistance then calculating the value of figure of merit and the percolation threshold.