Directed self-assembly of block copolymer thin film with vertical lamellae by applying filtered plasma and repeated shear stress
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초록
내용
Directed self-assembly (DSA) of block copolymer (BCP) is a promising technology for nanoscale lithography for semiconductors and nanodevices. Although defect-free BCP lamellar nanostructure with vertical orientation nanopattern is necessary for the wide range of applications of BCP self-assembly, the formation of defect-free BCP lamellar nanostructures with vertical orientation is still a difficult challenge. In this study, we proposed a new approach of filtered plasma treatment and repeated shear stress on BCP film for aligned and vertical lamellar BCP nanostructure. We introduced filtered plasma on the surface to produce crosslinked neutral surface, and subjected to shear stress to create a vertical oriented lamellae structures. In order to improve the quality of the alignment of the BCP nanostructures, the shear stress was repeatedly applied to the BCP film and the defects were greatly reduced. It suggests the potential for application in nanolithography and optical devices.