Surface modified magnetic particles removing nitrogen organic compounds in ultra pure water system
발표자
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초록
내용
Photolithography(PL) process mainly uses chemically amplified resist(CAR). CAR is sensitive for nitrogen organic compounds(NOC). NOC causes a T-topping phenomenon that adversely affects the process. In this study, we demonstrate surface modified magnetic(Fe3O4) particles that can reduce total organic carbon(TOC) in UPW by removing NOC. Functionalize using 3-acryloxypropyltrimethoxysilane(AcPTMS) was applied to magnetic particles. It is expected that the ester group and C=C double bond in AcPTMS will remove NOC. SEM and EDS analysis proved that the synthesis was successful. After the trimethylamine(TMA) and Urea exposing tests, the NOC collection capability of the samples was verified with XPS analysis. Samples mixed with IER was put into a column and passed through UPW to conduct TOC analysis. As a result, we found that the TOC can be reduced by catching NOC. This result shows the actual applicability of metal-organic hybrid structure to the UPW system.