Designing Multicolor Patterns of Plasmonic Metasurfaces via Colloidal- and Photo-Lithography
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초록
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Plasmonic colors are structural colors that emerge from resonant interactions between light and metallic nanostructures with high durability, spatial resolution and sustainability. Most nanopatterning for plasmonic colors are done by electron beam lithography, which is costly and time consuming. In this work, colloidal lithography is used for nanowell fabrication. Instead of precise electron beam patterning, colloidal lithography uses spin-coating and incubation, simple methods with high area coverage and low cost. By using acrylate containing polymers and silica particles for non-close packed structure generation, this technology further excludes the use of reactive ion etching and embedding process. Multiple colors are generated by varying incubation time, utilizing the hydrophilic property of silica. This nanopatterning strategy would open a new generation of low-cost, high-coverage 2D plasmonic color generation with applications such as security windows and information storage.