Sub-10 nm Perpendicular Lamellae of Fluoro-Acrylic Block Copolymer Films and Electric Field Induced Directed Assembly
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Block copolymers (BCPs) self-assembly have attract the “bottom-up” approach lithographical applications by its districted properties of spontaneous nanoscale structures in long-range alignment with small feature down to 5 nm. We present a fluorine containing BCPs of polystyrene-b-poly(2,2,2-trifluoroethyl acrylate) (PS-b-PTFEA) which the Flory-Huggins interaction parameter (χ) is higher than the conventional polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA). A neutralized substrate and top coat materials are applied where a sub-10 nm perpendicular lamellar morphology is observed with simple thermal annealing. The balanced interfacial interactions for the BCP films are tuned by overlaying neutral layers using the same monomer of the BCP with a fixed underlying neutral layer. We also demonstrate GISAXS experiment to confirm the orientation of perpendicular lamellae. Additionally, directed self-assembly (DSA) is induced by electric field resulting a long-range alignments.