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Directed Patterning of Quantum Dots Using Chemically Modified Surface for Light Emitting Diodes
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Here, we demonstrate directed patterning of quantum dots(QDs) using a unique imprinting method for the LEDs from chemically modified surface. The chemical patterns are initially fabricated by using selective chemical reaction of surface-modifying molecules on designed photoresist(PR) patterns. The QDs are then spin-coated on the patterned surface after removing the PR patterns. To transfer the QDs layer to the HTL, thin layer of PMMA is coated on the QDs layer as sacrificial layer and the layers of QDs/PMMA are imprinted to the target substrate using commercial adhesive tapes. As the tape is lifted, the only designed QDs patterns are selectively transferred from the chemically modified surface of the donor substrate due to surface energy difference. The QDs/PMMA/tape is subsequently placed on the ITO(Anode)/PEDOT:PSS(HIL)/TFB(HTL) for transferring the designed QDs patterns. As ZnO(ETL), Al(Cathode) are coated successively on the QDs layer, the QD-LEDs are fabricated and characterized.
발표코드
3PS-248
발표일정
2006-04-07 14:00 - 15:40