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발표분야
고분자구조 및 물성
발표 구분
포스터발표
제목
Designable Building Blocks for 3D Hierarchical Collective Structures via Residual Stress Engineering
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내용
Conversion of the 2D pattern into desired 3D architectures has drawn a great attention in materials community. Herein, we employed frontal photo-polymerization (FPP) to rapidly realize curvilinear 3D structures without a supporter at time scale of several seconds. Upon exposure to 365 nm UV light onto a patterned photocurable mixture and light-absorbing agent, a light intensity gradient develops inside the mixture. The generated light intensity gradient builds up residual stress, resulting in the curvilinear deformation. The morphology and dimensions of the 3D structures can be programmed by designing the photomask patterns and regulating the spatiotemporal light irradiation. First, we investigate geometric effects on the shape-morphing of photo-cured polymers with a rectangular pattern by varying aspect ratios and areas. Then, we demonstrate multi-leg patterns and a chiral-leg patterns. Finally, we introduce a strategy to construct 3D hierarchical structures by collective assembly.
발표코드
4PS-35
발표일정
2005-10-14 10:30 - 12:30