Join

Program Scientific Program
POS2-0430

Architectural Effect on the Microphase Separation Behavior of Bottlebrush Block Copolymers

Topic

S2. High-End Characterization/Polymer Physics/Properties

When and Where

Sep 29, 2026   08:30 - 09:30
Room 301 (Grand Ballroom)

Session Chairs

Hae Jung SON
Boseok KANG

Presenter(s)

Sungjun Lee (Korea University)

Co-Author(s)

Jaewon Jeong (Korea University), Gabriella Pasya (DGIST), Su-Mi Hur (DGIST), Joona Bang (Korea University)

Abstract

 Block copolymers (BCPs) have attracted significant attention as promising materials for next-generation nanolithography due to their ability to spontaneously form periodic nanostructures. In conventional linear BCPs, the microphase separation behavior is primarily governed by the Flory–Huggins interaction parameter (χ) and the degree of polymerization (N). However, bottlebrush block copolymers (BBCPs), characterized by densely grafted side chains along the polymer backbone, exhibit distinct conformational characteristics compared to linear BCPs. The presence of side chains can reduce direct interfacial contact between dissimilar polymer blocks, potentially leading to a decrease in the effective interaction parameter (χeff ) and consequently requiring a larger χN value for the order–disorder transition (ODT).
 To investigate this architectural effect, we synthesized a series of BBCPs based on polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) while systematically varying the side-chain molecular weight. The phase behavior of the resulting BBCPs was characterized by small-angle X-ray scattering (SAXS) and atomic force microscopy (AFM). The resulting χNODT values were significantly higher than those of linear BCPs, suggesting that bottlebrush architecture significantly influences the thermodynamics of microphase separation and shifts the order-disorder transition boundary toward higher segregation strength. These results highlight the importance of architectural effects in determining the phase behavior of BBCPs and provide molecular design guidelines for advanced nanopatterning applications.


 
Supported by
Korea Tourism Organization BUSAN TOURISM ORGANIZATION
Sponsored by
DONGWOO FINE-CHEM Co., Ltd. Korea Research Institute of Chemical Technology Advanced Materials Division Sejin CI DONGJIN SEMICHEM HAEDONG SCIENCE FOUNDATION COSMAX EcoProBM Young Eng. Sci. Doosan SAMSUNG SDI S-OIL 한국도레이과학진흥재단