POS3-1161
Single-Step Macroscopic Alignment of Block Copolymer Nanopatterns via Convective Self-Assembly
When and Where
Nov 30, -0001
12:00am - 12:00am
Presenter(s)
HongGu Kwon (Kongju National University)
Co-Author(s)
Abstract
Block copolymer (BCP) self-assembly has emerged as a simple and cost-effective approach for fabricating well-ordered nanopatterns over large areas, making it attractive for various nanofabrication applications. However, conventional alignment techniques generally require additional solvent vapor or thermal annealing processes, pre-patterned substrates, or specialized equipment, limiting their scalability and manufacturing efficiency. In this study, we applied convective self-assembly (CSA) to BCP thin films to achieve coating, self-assembly, and macroscopic alignment in a single step. Using polystyrene-block-polydimethylsiloxane (PS-b-PDMS) thin films, the microdomain orientation was systematically investigated as a function of stage speed and solution concentration. The results demonstrated that evaporation-induced convective flow effectively guided the alignment of BCP microdomains during film formation. In addition, a critical coating speed was identified, beyond which hydrodynamic instability at the meniscus significantly impaired the long-range ordering. Based on these observations, the interplay between solvent evaporation, meniscus dynamics, and microdomain ordering was elucidated, providing a predictive understanding of the alignment pathway during continuous processing. This single-step approach offers a simple and scalable method for fabricating highly aligned BCP nanopatterns without additional pre- or post-treatment processes, enabling more efficient and cost-effective large-area nanofabrication.
