Thermally stable photobase generators (PBGs) are essential for enhancing the patterning resolution of photoacid generator (PAG)-based chemically amplified photoresists, as they generate basic compounds that neutralized excess acidic compounds produced by PAGs. However, the low thermal stability of many PBGs limits their effectiveness in photoresist development. In this study, we present a thermally stable PBGs, 9-anthrylmethyl N,N-diethyl carbamate, featuring carbamate and anthracene moieties as the base and chromophore compounds, respectively. This synthesized PBG exhibits a high decomposition temperature (Td > 280℃), as determined by thermogravimetric analysis (TGA), and demonstrates strong absorption in the spectral range between 300-400 nm. Additionally, it shows high purity (> 99%) and low water content (< 600 ppm), which are essential for minimizing defects in the photolithography process.