Fabrication of self-cleaning & antireflective surface <em>via</em> the self-assembly approach
발표자
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초록
내용
Antireflection coating (ARC) is essential for unwanted reflection and solar energy efficiency. Traditional ARC such as chemical vapor deposition requires additional processes on already coated ARC for multifunctionality has the potential to degrade performance. However, antireflective (AR) nanostructures inspired by the eyes of moths can solve these limitations. Self-assembly approach can provide great opportunity to make AR nanostructures. In this work, metals ions electrically attracted to the pyridine containing blocks were used as metal mask in BCP lithography. And in colloidal lithography, monolayer coated polystyrene (PS) nanoparticles were used as etch mask. Then reactive ion etching (RIE) was performed for the pattern transfer. And etched samples were immersed in silane solution for functional group exchange. The morphologies of AR structures were characterized by SEM. UV/VIS Spectrometer was used to investigate the optical performance according to the lithography method.