Sub-10 nm Perpendicular Lamellae of Si- & F- containing Block Copolymer Films and Electric Field Induced Directed Assembly
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A high-χ, low-N, silicon- and fluorine-containing block copolymer (BCP) was designed using the superhydrophobicity and low glass transition temperature of polydimethylsiloxane (PDMS). PDMS-b-poly(2,2,3,3,3-pentafluoropropyl acrylate) (PDMS-b-PPeFPA) was synthesized to form a symmetric lamellar structure with sub-10 nm half-pitch feature size. The identical surface tensions of the blocks (?PDMS ≈ ?PPeFPA) and dual neutral interfaces facilitated the formation of perpendicular lamellar microdomains at room temperature. The BCP films aligned along a lateral electric field, demonstrating adaptive response. The PDMS-b-PPeFPA system showed remarkable etch contrast for O2 reactive ion etching, producing unidirectional air-inorganic nanoarrays. This work presents a system engineering approach for creating perpendicularly oriented lamellar microdomains in highly immiscible BCPs, addressing substrate neutrality and surface tension matching.