<u>Unidirectional Directed Self-assembly of Nanostructures in Block Copolymer Films</u>
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While high NA EUV is highlighted in next-generation semiconductor patterning below 2 nm node, directed self-assembly for unidirectionally aligned BCP patterns to improve pattern quality is being seriously considered. Inspired by rubbing in display and the rolling of steel plates, we developed a shear-rolling process with different speeds between the roller and the substrate for unidirectionally aligned and vertically oriented lamellar BCP nanostructures in a wide area less than 1 min. Recently, highly unidirectional orientation of sub-10 nm nanopatterns can be produced in a roll-to-roll scale with a single shear of less than 0.1 s at an ultra-high temperature of 280 C even on flexible substrates. Based on this, we fabricated a quasi-monocrystalline 3D nanogyroid thin film over 4 inch by shear-rolling for unidirectional alignment and solvent annealing for phase change to isotropic gyroids. In addition, we also applied to provide mechanical anisotropy of thermoplastic elastomers for distortion-free stretchable display.