Direct Optical Patterning of Perovskite Color Conversion Layers with In-Situ Crystallization
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초록
내용
Recently, Metal Halide Perovskites (MHPs) are gaining attention as a next-generation light emitting material due to its high color purity, defect tolerance, and color tunability. In order to utilize MHPs in light emitting devices, especially as a color conversion material, patterning technologies that can achieve high thickness and high resolution are essential. However, due to the lability of MHPs, there are many constraints during the patterning process. To overcome this issue, we present a direct optical lithography based on in-situ crystallization. After the patterning process is performed in the precursor state, the precursor within the polymer matrix undergoes in-situ crystallization. We were able to create bright MHPs-polymer patterns with resolutions of tens of micrometers and thicknesses of a few micrometers.