Crosslinking-Assisted Indirect Photopatterning of Quantum Dots
발표자
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초록
내용
Micrometer-scale patterns of quantum dots (QDs) with exceptional fidelity are formed using crosslinking-assisted, photoresist-guided indirect (PIN) photopatterning without compromising their luminescence characteristics. The method employs Diazo-4-LiXer, a crosslinker, to bridge neighboring QDs by exploiting the carbene-based reaction of the diazo functional group, which is activated at low temperatures. Thanks to the sufficiently low processing temperature, the luminous properties of QDs (including their photoluminescence and electroluminescence characteristics) are preserved and the QD films are crosslinked without affecting the underlying photoresist pre-patterns which serve as structural guides in during QD pattern formation. By using PIN photopatterning, we form high-fidelity RGB QD patterns with pixel densities exceeding 4000 pixels per inch. The compatibility of PIN photopatterning with the apparatus used in the display industry signifies its application potential.