Synthesis and photolithographic evaluation of poly(vinyl alcohol)-based water-processable photoresists with stilbene groups
발표자
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초록
내용
Water-processable photoresists, processed in aqueous solutions, represent a significant advancement in photolithography due to their environmental compatibility and simplified processing compared to traditional photoresists. This study focuses on a water-processable photoresist, PVA-SBQ, synthesized from PVA and SBQ salt, incorporating photo-reversible stilbene groups. The chemical structure of PVA-SBQ was confirmed by FT-IR and NMR spectroscopy. The photo-reversible reaction was demonstrated by UV-Vis and FT-IR spectroscopy, showing cyclobutane ring formation via stilbene group photo-dimerization under 365 nm-UV exposure, which reverted to stilbene under deep UV exposure. UV-LED exposure and water development yielded well-defined negative type patterns. This complete water processability not only addresses environmental concerns but also opens new application possibilities in microfluidics, interference lithography, and three-dimensional biological constructs.