Single-exposure production of Doubly Re-entrant Microstructures through Reaction-Diffusion Photolithography for Omniphobic Surfaces.
발표자
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초록
내용
An omniphobic surface composed of biomimetic doubly re-entrant structures is non-wetting regardless of a liquid's wettability. The non-chemically treated, omniphobic surface is attractive for electronic and biological applications. As there are more re-entrant structures, the surface has become more omniphobic. A simple and inexpensive photolithography process was used to create a multiply re-entrant structure. Due to the limitation of only being able to expose vertically, many steps were required to produce three-dimensional complex microstructures. The polymerization of three-dimensional structures in a single-exposure is a great challenge, but it will simplify the process steps and significantly reduce industrial costs. Previous studies had shown the possibility of overcoming the limitation that only planar structures can be fabricated using oxygen diffusion and radical reactions. Here, doubly re-entrant structures were produced with a single-exposure using reaction-diffusion photolithography.