Fabrication of anti-reflection film using moth-eye structure with parylene-C
발표자
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초록
내용
Poly(monochloro-p-xylylene) (parylene-C) is widely used as a conformal protective layer in organic electronics such as organic light emitting diodes and organic photovoltaic cells, due to its high chemical resistance and gas barrier property. However, the optical reflectance of the parylene-C film reduced the efficiencies of optoelectric devices. In this research, we fabricated an anti-reflection (AR) film using moth-eye structured parylene-C, which was deposited on anodic aluminum oxide (AAO) template by using the chemical vapor deposition (CVD) method. The reflectance of parylene-C with the moth-eye structure was 90% lower than that of a flat parylene-C film without nanostructures. Based on the optical simulation with gradual change of refractive index of the AR film, an optimized reflectance of the moth-eye structured parylene-C film was achieved by controlling the film thickness, diameter and height of the nanostructures.