Fabrication of monolayer polystyrene pattern with various and complex three-dimensional structuresthrough mold-assisted lithographic technology
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Regular 3D microstructure array is widely used in industrial fields such as microlenses, biosensors, displays, energy devices, and photonic crystals. In particular, a technique for producing a pattern using self-assembly of spherical particles is widely known. The colloidal particle pattern produced in this way has a period of several hundred nanometers to several microns in structure. This structure, in which different materials are arranged in three dimensions, can control the flow of light, and has been used in various optical devices using this property. Here, we developed the fabrication process for monolayer polystyrene (PS) pattern with various and complex three-dimensional structures via mold-assisted patterning technology. We have recently developed a process (IAL) to fabricate a PDMS film having a pattern with a high-curvature structure. Based on the IAL technology developed in our laboratory, spherical PS array patterns with various structures were fabricated using capillary force lithography.