Interfacial and structural characteristics of the self-assembled copolymer thin films analyzed by synchrotron X-ray scattering
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Self-assembly of copolymer thin film is regarded as one of the most desirable technologies for the up-to-date nanoindustrial fields thanks to its mass-productivity with minimized material consumption. This technique provides highly-ordered nanostructures whose dimension, composition and orientation can be precisely controlled. However, the underlying mechanism often peculiarly deviates from that of the bulk state because the interfacial interaction between copolymer thin films and the adjacent surfaces significantly affects the thin film nanostructure. In this study, to comprehend the interfacial and structural characteristics of the self-assembled polystyrene-b-poly methyl methacrylate (PS-b-PMMA) thin films, a synchrotron X-ray scattering has been actively applied with the aid of the excellent flux as well as the tunable photon energies.