Hierarchical silica nanostructure fabrication for antireflective coating based on organic-inorganic hybrid
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초록
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Silica nanostructures find a variety of applications including modern thin-film applications. Among the various approaches, the simplest way to control silica nanostructures is sol-gel method. However, in our work, SSQZ was used as a replacement silica precursor instead of using a sol-gel process. Since SSQZ has an amine group in the silica-based chain, it has an advantage that it is easy to bond with organic materials when compared with silsesquioxane having a si-o-si structure. In this study, coating was performed stepwise to show the hierarchical structure. First, the silica particles were coated on the substrate and the structure of ssqz was controlled by self-assembly of ABC triblock copolymer. The controlled structures exhibit antireflective properties for high performance in optoelectronic devices. The silica nanostructures were observed through AFM and SEM, and UV-vis spectrometer was used to measure antireflective properties.